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A study of the optical and polarisation properties of InGaN/GaN multiple quantum wells grown on a-plane and m-plane GaN substrates

机译:在a平面和m平面GaN衬底上生长的InGaN / GaN多量子阱的光学和偏振特性的研究

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摘要

We report on a comparative study of the low temperature emission and polarisation properties of InGaN/GaN quantum wells grown on nonpolar (112¯0) a-plane and (101¯0) m-plane free-standing bulk GaN substrates where the In content varied from 0.14 to 0.28 in the m-plane series and 0.08 to 0.21 for the a-plane series. The low temperature photoluminescence spectra from both sets of samples are broad with full width at half maximum height increasing from 81 to 330 meV as the In fraction increases. Photoluminescence excitation spectroscopy indicates that the recombination mainly involves strongly localised carriers. At 10 K the degree of linear polarisation of the a-plane samples is much smaller than of the m-plane counterparts and also varies across the spectrum. From polarisation-resolved photoluminescence excitation spectroscopy we measured the energy splitting between the lowest valence sub-bands to lie in the range of 23–54 meV for the a- and m-plane samples in which we could observe distinct exciton features. Thus the thermal occupation of a higher valence sub-band cannot be responsible for the reduction of the degree of linear polarisation at 10 K. Time-resolved spectroscopy indicates that in a-plane samples there is an extra emission component which is at least partly responsible for the reduction in the degree of linear polarisation.
机译:我们报告了在非极性( 11 2 ¯ 0 )一个平面和( 10 1 ¯ 0 )m平面独立的块状GaN衬底,其中In含量在m平面系列中从0.14到0.28不等,在a平面系列中从0.08到0.21不等。两组样品的低温光致发光光谱都很宽,随着In分数的增加,半高处的全宽从81到330meV。光致发光激发光谱表明重组主要涉及强定位的载体。在10 K时,a平面样本的线性极化程度远小于m平面样本的线性极化程度,并且在整个光谱范围内也会变化。从偏振分辨光致发光激发光谱中,我们测量了a和m平面样本的最低价子带之间的能量分裂,范围在23–54meV之间,在其中我们可以观察到明显的激子特征。因此,较高价子带的热占据不能造成10 K时线性极化程度的降低。时间分辨光谱表明,在a平面样品中存在额外的发射分量,这至少是部分原因用于降低线性极化度。

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