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Origin of radiation tolerance in amorphous Ge2Sb2Te5 phase-change random-access memory material

机译:非晶Ge2Sb2Te5相变随机存取存储材料的耐辐射性起因

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摘要

The radiation hardness of amorphous Ge2Sb2Te5 phase-change random-access memory material has been elucidated by ab initio molecular-dynamics simulations. Ionizing radiation events have been modeled to investigate their effect on the atomic and electronic structure of the glass. Investigation of the short- and medium-range order highlights a structural recovery of the amorphous network after exposure to the high-energy events modeled in this study. Analysis of the modeled glasses reveals specific structural rearrangements in the local atomic geometry of the glass, as well as an increase in the formation of large shortest-path rings. The electronic structure of the modeled system is not significantly affected by the ionizing radiation events, since negligible differences have been observed before and after irradiation. These results provide a detailed insight into the atomistic structure of amorphous Ge2Sb2Te5 after irradiation and demonstrate the radiation hardness of the glass matrix.
机译:从头算分子动力学模拟已经阐明了非晶态Ge2Sb2Te5相变随机存取存储材料的辐射硬度。已经对电离辐射事件进行了建模,以研究其对玻璃原子和电子结构的影响。对短程和中程有序研究表明,暴露于本研究中建模的高能事件后,非晶网络的结构恢复。对模型化玻璃的分析揭示了玻璃的局部原子几何结构中的特定结构重排,以及大的最短路径环的形成增加。电离辐射事件不会显着影响建模系统的电子结构,因为在辐照前后观察到的差异可忽略不计。这些结果提供了对非晶态Ge2Sb2Te5辐照后原子结构的详细了解,并证明了玻璃基质的辐照硬度。

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