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Electrochemical Behavior of Al(III) and Formation of Different Phases Al-Ni Alloys Deposits from LiCl-KCl-AlCl3 Molten Salt

机译:LiCl-KCl-AlCl3熔盐对Al(III)的电化学行为及不同相的Al-Ni合金沉积的形成

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摘要

The electrochemical behaviors of Al(III) deposits on Ni substrates were investigated in LiCl-KCl-AlCl3 (2 wt.%) molten salts. Various electrochemical methods, including cyclic voltammetry (CV), square wave voltammetry (SWV), and open circuit chronopotentiometry (OCP) were used to explore the deposition processes of Al(III) on Ni substrates. Five kinds of Al-Ni alloys phase were firstly electrodeposited by the regulation of deposition potential form LiCl-KCl-AlCl3 (2 wt.%) molten salts at 753 K. The formation of Al-Ni alloys, such as AlNi3, Ni5Al3, AlNi, Al3Ni2, and Al3Ni were confirmed by X-ray diffractometer (XRD) and the cross-section morphologies were investigated by scanning electron microscope (SEM). Meanwhile, it was found that the temperature of molten salt was another key parameter for the controlling of alloys phase. No Al-Ni alloys phase other than AlNi3 and Ni5Al3 could be deposited at 703 K.
机译:在LiCl-KCl-AlCl3(2 wt。%)熔融盐中研究了Ni基体上Al(III)沉积物的电化学行为。各种电化学方法,包括循环伏安法(CV),方波伏安法(SWV)和开路计时电位法(OCP)被用于探索Al(III)在Ni基体上的沉积过程。首先通过调节LiCl-KCl-AlCl3(2 wt。%)熔融盐在753 K时的沉积电势调节来沉积五种Al-Ni合金相。AlNi3,Ni5Al3,AlNi等Al-Ni合金的形成X射线衍射仪(XRD)确认了Al3Ni2和Al3Ni的含量,并用扫描电子显微镜(SEM)研究了截面形貌。同时,发现熔融盐的温度是控制合金相的另一个关键参数。除AlNi3和Ni5Al3外,没有任何Al-Ni合金相可以在703 K处沉积。

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