沉积参数对硅碳氧薄膜光学性能的影响研究

摘要

硅碳氧薄膜拥有热稳定性好、能带宽、折射率大、硬度高、热导率高等优异性能，是一种具有潜在应用价值的新颖光学薄膜。采用射频磁控溅射技术在K9玻璃上制备了硅碳氧薄膜，并研究了沉积参数对硅碳氧薄膜光学性能的影响。结果表明，所制备的硅碳氧薄膜呈现出优异的光学透射性能，工作压力的增高和溅射功率的降低都会使薄膜的透射光谱发生蓝移现象，而基片温度的降低、工作压力的升高及溅射功率的减小都能使薄膜的光学透射性能更好。改变沉积参数，可以获得不同的薄膜沉积速率。折射率在1．80～2．20之间变化。%Silicon oxycarbide (SiCXO4-X) thin films, an advanced optical material, have many preferred properties, such as high thermal conductivity , low thermal expansion coefficient , high hardness and so on.SiCO thin films have been deposited using RF-magnetron sputtering technology .The influence of deposition parameters on optical properties of SiCO thin film was studied.The result showed that SiCO thin films presented excellent optical properties.Decreasing of substrate temperature and sputtering power, the rising of working pressure could improve the transmission properties of SiCO films. Different deposition rate could be obtained by varying deposition parameters .The refractive index had a wide region range from 1.80~2.20.