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中文期刊>材料科学与工程：中英文B版
>Effect of Deposition Temperature on the Physical Characteristic of GaN Thin Films Deposited by Spincoating Technique on a Sapphire Substrate Using Gallium-Citrate-Amine Gel and Nitrogen Gas
Effect of Deposition Temperature on the Physical Characteristic of GaN Thin Films Deposited by Spincoating Technique on a Sapphire Substrate Using Gallium-Citrate-Amine Gel and Nitrogen Gas
