圆柱形单模MPCVD装置的数值模拟与实验研究

摘要

微波等离子体化学气相沉积(MPCVD)法因其独特的优势被认为是制备高质量金刚石膜的首选方法.本实验对圆柱形MPCVD装置谐振腔中的电场分布及强度进行了数值模拟,在此基础上,在自行研制的圆柱形单模MPCVD装置上,进行了等离子体放电和金刚石膜的制备.结果表明:在输入功率仅为100 W的情况下,自行研制的圆柱形单模MPCVD装置的基片上方模拟计算得到的最高电场强度可达3.0×105V/m,即电场具有较好的聚焦能力,石英板式窗口的设计避免了等离子体的刻蚀.同时,在直径50 mm硅片上进行了微米及纳米金刚石膜的生长研究,沉积出高质量金刚石膜.研究结果为MPCVD装置的研制提供了理论指导.%Microwave plasma chemical vapor deposition (MPCVD) is considered to be an important method for the high quality diamond films deposition due to its unique advantages.The electric field distribution and strength in the cylindrical single-mode cavity are numerical simulated,meanwhile the study on the plasma discharge and the diamond films deposition are carried out on the MPCVD device.The results show that the simulated maximum electric field strength of the cylindrical single mode MPCVD device is 3.0 × 105 V/m when the input power is only 100 W,which shows that the cavity possesses excellent focusing capability,and the design of quartz window can avoids plasma etching at the same time.In addition,High quality micro and nano diamond films are obtained on the diameter of 50 mm silicon wafer.The results provide theoretical guidance for the development of MPCVD devices.