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Epitaxial aluminum oxide thin films on niobium (110): A study of their growth and their use in superconducting tunnel-junctions.

机译:铌(110)上的外延氧化铝薄膜:研究其生长及其在超导隧道结中的应用。

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摘要

Epitaxial hetero-structures have been turned to in recent years in an attempt to eliminate charge fluctuations in Josephson junction-based quantum bits. Amorphous tunnel-barriers have large numbers of two-level fluctuators that can couple to the quantum states in the device. Single-crystal tunnel-barriers on the other hand show a reduced density of these two-level fluctuators. For my thesis research I studied the hetero-epitaxy of aluminum oxide on niobium, and the use of these aluminum oxide thin films as tunnel-barriers. Single-crystal Nb/Al2O3 and Nb/Al2O3/Nb multi-layers were grown by molecular beam epitaxy and characterized using a variety of materials analysis techniques. Atomically-flat niobium films grown on A-plane sapphire were used for the subsequent hetero-epitaxy of aluminum oxide. Depending on the thermal treatment used during growth, these niobium films had two distinct surface reconstructions. Using in situ RHEED I found that the growth of Al2O3 was highly dependent on the surface reconstruction of the underlying niobium film. Alumina films on annealed Nb had a hexagonal lattice that was under an isotropic tensile strain that relaxed with increasing film thickness. In contrast, alumina films on unannealed Nb showed an asymmetric strain and a pseudo-hexagonal lattice closely resembling that of the underlying niobium. Epitaxial niobium over-layers also tiled these two alumina surfaces differently, with in-plane orientations suggestive of irregular cation sublattices in the oxide film. It was also found using TEM imaging that an atomically sharp interface existed between the aluminum oxide film and the base niobium layer. However, mixing was seen to occur with the deposition of the over-layer, causing a deterioration of the alumina barrier. This mixing had a profound effect on tunnel-junctions fabricated from these tri-layers. Devices showed very poor qualities overall, with current-voltage characteristics indicative of a large density of electrical pinholes. With these findings in mind, some potential solutions are proposed.
机译:近年来,人们开始寻求外延异质结构,以消除基于约瑟夫逊结的量子位中的电荷波动。非晶隧道势垒具有大量的两能级波动子,它们可以耦合到器件中的量子态。另一方面,单晶隧道势垒显示出这些两级波动器的密度降低。在我的论文研究中,我研究了氧化铝在铌上的异质外延性,以及这些氧化铝薄膜作为隧道势垒的用途。 Nb / Al2O3和Nb / Al2O3 / Nb单晶多层膜通过分子束外延生长,并使用多种材料分析技术进行表征。在A面蓝宝石上生长的原子平坦的铌膜用于随后的氧化铝异质外延。根据生长过程中使用的热处理,这些铌膜具有两种不同的表面重建。使用原位RHEED,我发现Al2O3的生长高度依赖于下面的铌膜的表面重建。退火Nb上的氧化铝膜具有六方晶格,该晶格处于各向同性拉伸应变下,随着膜厚的增加而松弛。相反,未退火的Nb上的氧化铝膜显示出不对称的应变和近似六方晶格的准六方晶格。外延铌覆盖层还以不同的方式铺贴了这两个氧化铝表面,其面内取向表明氧化膜中存在不规则的阳离子亚晶格。还使用TEM成像发现在氧化铝膜和基础铌层之间存在原子上清晰的界面。但是,发现随着上层的沉积而发生混合,导致氧化铝阻挡层的劣化。这种混合对由这些三层制成的隧道结产生了深远的影响。器件的整体质量很差,电流-电压特性表明电针孔的密度很大。考虑到这些发现,提出了一些潜在的解决方案。

著录项

  • 作者

    Welander, Paul Brent.;

  • 作者单位

    University of Illinois at Urbana-Champaign.;

  • 授予单位 University of Illinois at Urbana-Champaign.;
  • 学科 Physics Condensed Matter.;Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2007
  • 页码 79 p.
  • 总页数 79
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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