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High-peak-power fiber-laser technology for laser-produced-plasma extreme-ultraviolet lithography.

机译:高峰值功率光纤激光器技术,用于激光产生的等离子体极紫外光刻。

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摘要

This dissertation studied and demonstrated, for the first time, the feasibility of using a fiber laser as a practical EUV driver for next generation lithography. Our specially-designed fiber laser successfully emulated the same conversion efficiency achieved by the solid-state lasers, which was not believed possible before this study. An innovative spectral combining scheme was also developed to accommodate the broad linewidth from a high-peak-power fiber-laser with concurrent MW-peak power and multi-kW average power, as required to reach the EUV power for high-volume manufacturing.;The concept of a single-emitter-fiber-integrated module (SEFIM) was realized. Using an 80-mum-core Yb-doped large-mode-area fiber, we achieved a record high peak power ∼ 6MW with 110-ps pulses and 6 mJ energy with 6-ns pulses, giving a near-diffraction-limited mode quality of M2 ∼ 1.3. These pulse parameters will provide sufficient intensities for optimal EUV generation using Sn targets. High average power 140 W is also achieved with proper forced cooling arrangements. Implementation of arbitrary waveform generator as the seed driver also provided pulse-temporal-shaping capability, providing an instrumental tool for the study of plasma dynamics.;The first 13.5-nm EUV generation was demonstrated using our single emitter module, with a conversion efficiency 1% at a intensity of 1.0 x 10 10W/cm2, using a solid-Sn planar target. Conversion efficiency was limited by the highest achievable laser intensity at the time. The second demonstration, using the improved SEFIM and Sn-doped water-droplet targets, achieved a conversion efficiency of 2.1% at a intensity of 8.8 x 1010W/ cm2. The intrinsic advantages of this mass-limited target greatly are debris mitigation and compatibility with high repetition rate power scaling.;We developed a new high power spectral beam combing scheme based on sharp-spectral-edge multi-layer dielectric filters, which does not use spectral spatial dispersion and, therefore, is free from the constraints on laser linewidth and beam size inherent in conventional diffraction-grating-based beam-combining approaches. This scheme is particularly well suited for high energy pulse power combining, as experimentally demonstrated in >91% efficient combination of three nanosecond-pulse fiber laser beams with a combined power and energy of 52 W and 4.0 mJ respectively.
机译:本文首次研究并证明了将光纤激光器用作下一代光刻的实际EUV驱动器的可行性。我们特别设计的光纤激光器成功地模拟了固态激光器所能达到的相同转换效率,这在这项研究之前是不可能的。还开发了一种创新的频谱组合方案,以适应高峰值功率光纤激光器的宽线宽,同时具有MW峰值功率和几kW的平均功率,以达到大批量生产的EUV功率。实现了单发射器光纤集成模块(SEFIM)的概念。使用80芯的掺Yb大模式区域光纤,我们在110ps的脉冲下达到了创纪录的高峰值功率〜6MW,在6ns的脉冲下实现了6 mJ的能量,从而提供了近衍射极限模式质量M2〜1.3。这些脉冲参数将为使用Sn靶产生最佳EUV提供足够的强度。适当的强制冷却装置也可实现140 W的高平均功率。将任意波形发生器用作种子驱动器还提供了脉冲时间整形功能,为研究等离子体动力学提供了一种工具。使用我们的单发射器模块演示了第一代13.5 nm EUV,转换效率为1使用固体Sn平面靶材在1.0 x 10 10W / cm2的强度下达到%。转换效率受到当时可达到的最高激光强度的限制。第二个演示使用改进的SEFIM和Sn掺杂的水滴靶,在8.8 x 1010W / cm2的强度下实现了2.1%的转换效率。这种受质量限制的目标的固有优势极大地减少了碎片并具有高重复率功率缩放的兼容性。我们开发了一种基于尖光谱边缘多层介电滤波器的新型高功率谱束梳理方案,该方案不使用光谱空间色散,因此不受传统的基于衍射光栅的光束组合方法固有的激光线宽和光束尺寸的限制。该方案特别适合于高能量脉冲功率组合,如通过实验证明,组合功率和能量分别为52 W和4.0 mJ的三个纳秒脉冲光纤激光束的有效组合> 91%。

著录项

  • 作者

    Hou, Kai-Chung.;

  • 作者单位

    University of Michigan.;

  • 授予单位 University of Michigan.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2008
  • 页码 149 p.
  • 总页数 149
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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