INFLUENCE OF POLISHER SURFACE STRUCTURE ON ULTRA-SMOOTHNESS POLISHING CHARACTERISTIC OF MAGNETIC DISK SUBSTRATE

摘要

The main conclusions obtained are as follows;rn1) The pore size on the polisher formed by buffing of the new pad increases with the increase of buffing depth.rn2) The removal rate of substrate done in the first polishing stage with alumina abrasives is larger for smaller pore size.rn3) The substrate waviness and roll-off formed in the first polishing stage with alumina abrasives become smaller for smaller pore size.