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CARACTERISTICS OF TiN COATING FILMS FOR LARGE SIZES PREPARED BY ARC ION PLATING

机译:电弧离子镀制备的大尺寸TiN镀膜的特性

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摘要

Arc ion plating (AIP) is one of the most attractive physical vapour deposition (PVD) method for the industrial manufacture of TiN coatings, owing to a high degree of ionization in the target material and convenient control of the process parameters. The important characteristic of hard coating is the adhesion strength between the coating layer and the substrate. The coating will be subjected to various loads, such as mechanical, thermal load, etc., in practical applications. Therefore, for more than a decade, Ti-based hard coatings have been applied to tools, dies, and mechanical parts because of the enhance lifetime and performance. It is focus on the attractive properties such as high hardness, good wear, and chemical stability. In the present study, TiN monolayer film was prepared at various N2 partial pressures and current by the AIP technique in SACM645 material. The correlation between microstructure and properties of the TiN coating was comparatively investigated by XRD, FE-SEM and AFM. These study carried steadily out improve the adhesion properties and wear resistance of Ti-based coating using pre-treatment of the substrate, insertion of an interlayer, application of multi-layers and adjustment of the process parameters. The main phase FCC TiN displayed (200) orientation in the film with the highest N_2 partial pressure. The (111) orientation was observed with decreasing N_2 partial pressure. The (200) and (111) textures in the film which was treated 80A arc current were found to be competitive orientations, however stronger arc treated the (200) texture was increased. The multilayer TiN films has possessed high hardness (up to 42Nm) and the best wear resistance among the specimens. These features were attributed to the presence of dense microstructures that were mainly composed of TiN phase around 5.16 fan thickness, HF1 adhesion and Ra 35 run surface roughness.
机译:电弧离子镀(AIP)是用于TiN涂层工业生产的最有吸引力的物理气相沉积(PVD)方法之一,这是由于目标材料中的高度电离和方便地控制工艺参数。硬涂层的重要特征是涂层与基材之间的粘合强度。在实际应用中,涂层将承受各种载荷,例如机械载荷,热载荷等。因此,十多年来,由于延长了使用寿命和提高了性能,钛基硬质涂层已应用于工具,模具和机械零件。它专注于吸引人的特性,例如高硬度,良好的耐磨性和化学稳定性。在本研究中,通过AIP技术在SACM645材料中在各种N2分压和电流下制备TiN单层膜。用XRD,FE-SEM和AFM比较研究了TiN涂层的组织与性能之间的关系。这些研究通过对基材进行预处理,插入中间层,应用多层和调整工艺参数来稳定地改善Ti基涂层的附着性能和耐磨性。主相FCC TiN在具有最高N_2分压的薄膜中显示(200)取向。随着N_2分压的降低,观察到了(111)取向。发现在经80A电弧电流处理的膜中的(200)和(111)织构为竞争取向,但是经更强电弧处理的(200)织构增加。多层TiN膜具有高硬度(高达42Nm)和最佳的耐磨性。这些特征归因于致密微观结构的存在,致密微观结构主要由5.16风扇厚度附近的TiN相,HF1附着力和Ra 35滑动表面粗糙度组成。

著录项

  • 来源
    《THERMEC 2011》|2011年|p.2589-2595|共7页
  • 会议地点 Quebec City(CA);Quebec City(CA)
  • 作者单位

    Technology Laboratory, SAMWOO ECO., LTD., #739-5, Chonam-Ri, Gwangyang-Eub,Gwangyang-Si, Jeonnam, 545-801, Korea;

    Technology Laboratory, SAMWOO ECO., LTD., #739-5, Chonam-Ri, Gwangyang-Eub,Gwangyang-Si, Jeonnam, 545-801, Korea;

    Technology Laboratory, SAMWOO ECO., LTD., #739-5, Chonam-Ri, Gwangyang-Eub,Gwangyang-Si, Jeonnam, 545-801, Korea;

    Sunchon Center, Korea Basic Science Institute, Sunchon 540-742, Korea;

    Hub University for Industrial Collaboration, Sunchon National University, Sunchon, 540-742,Korea;

    Hub University for Industrial Collaboration, Sunchon National University, Sunchon, 540-742,Korea;

    RD Center for Ti and Special Alloys, Gwangju Techno Park, Gwangju, Korea;

    POSCO Gwangyang Works, Surface Treatment Dept., 700, Gumho-dong, Gwangyang-si,Jeonnam, 545-711,Korea;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料一般性问题;
  • 关键词

    AIP; TiN; PVD;

    机译:应用程式;三;帕夫;

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