首页> 外文会议>Symposium on Thin-Films - Stresses and Mechanical properties Vii, held December 1-5, 1997, Boston, Massachusetts, U.S.A. >Two-dimensional distribution of the residual stress in MBE-grown InGaAs-GaAs strained-layer superlattices
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Two-dimensional distribution of the residual stress in MBE-grown InGaAs-GaAs strained-layer superlattices

机译:MBE生长的InGaAs-GaAs应变层超晶格中残余应力的二维分布

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Distribution of the residual stress in InGaAs/GaAs strained layer superlattices (SLSs) has been investigated by the micro-focus photoluminescence (PL) method and PL topography. Dark lines parallel or perpendicular to [011] direction were observed in the samples by PL topography. The density of dark lines was decreased as the thickness of In_(0.1)Ga_(0.9)As layers increased. Such dark lines were observed even in a sample whose thickness was thinner than critical value. These dark areas corresponded to the regions where the peak wavelength of PL spectrum was shifted to longer side because of tensile stress. These results were explained well by our proposed model. That is, tensile stress acts the top of mountainous regions of wrinkles which were formed by compressive stress caused by the difference of the lattice constant between InGaAs and GaAs.
机译:InGaAs / GaAs应变层超晶格(SLSs)中的残余应力分布已通过微焦点光致发光(PL)方法和PL形貌进行了研究。通过PL形貌在样品中观察到平行于或垂直于[011]方向的暗线。随着In_(0.1)Ga_(0.9)As层的厚度增加,暗线的密度降低。即使在厚度小于临界值的样品中也观察到这样的黑线。这些暗区域对应于PL光谱的峰值波长由于拉伸应力而移向较长侧的区域。我们提出的模型很好地解释了这些结果。即,拉伸应力作用于皱纹的山区的顶部,该皱纹是由InGaAs和GaAs之间的晶格常数差异引起的压应力形成的。

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