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Carrier pocket engineering to design superior thermoelectric materials using GaAs/AlAs superlatices

机译:载流子袋工程设计,可使用GaAs / AlAs超晶格设计优质热电材料

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摘要

A large enhancement in the thermoelectric figure of merit for the whole superlattice, Z_(3D)T, is predicted for short period GaAs/AlAs superlattices relative to builk GaAs. Various superlattice parameters (superlattice growth direction, superlattice period and layer thicknesses) are explored to optimize Z_(3D)T, including quantum wells formed at various high symmetry points in the Brillouin zone. The highest room temperature Z_(3D)T obtained in the present calculation is 0.41 at the optimum carrier conentration for either (001) or (111) oriented GaAs(20 A)/AlAs(20 A) superlattices, which is bout 50 times greater than the corresponding ZT for bulk GaAs obtained using the same basic model.
机译:相对于块状GaAs,预计短期GaAs / AlAs超晶格的整个超晶格Z_(3D)T的热电品质因数会大大提高。探索了各种超晶格参数(超晶格生长方向,超晶格周期和层厚度)以优化Z_(3D)T,包括在布里渊区各个高对称点处形成的量子阱。对于(001)或(111)取向的GaAs(20 A)/ AlAs(20 A)超晶格,在最佳载流子浓度下,本计算中获得的最高室温Z_(3D)T为0.41。比使用相同基本模型获得的块状GaAs的相应ZT大。

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