首页> 外文会议>Symposium on Semiconductor Quantum Dots held April 5-8, 1999, San Francisco, California,U.S.A. >Inter-sub-level spectroscopy of p-type modulation-doped Ge quantum dots
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Inter-sub-level spectroscopy of p-type modulation-doped Ge quantum dots

机译:p型调制掺杂的Ge量子点的子层间光谱

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摘要

Inter-sub-level transitions in p-type modulation-doped Ge quantum dots are observed. The structure is grown by molecular beam epitaxy and consists of 30 periods of Ge quantum dots separated by 6 nm boron-doped Si layers. An absorption peak in the mid-infrared range is observed at room temperature by Fourier transform infrared spectroscopy, and is attributed to the transition between the first two heavy hole states of the Ge quantum dots. This study suggests the possible use of modulation-doped Ge quantum dots for improved infrared detector application.
机译:在p型调制掺杂的Ge量子点中观察到子级间跃迁。该结构通过分子束外延生长,由30个周期的Ge量子点组成,这些量子点被6 nm掺硼Si层隔开。在室温下通过傅里叶变换红外光谱法观察到了中红外吸收峰,这归因于Ge量子点的前两个重空穴状态之间的跃迁。这项研究表明可能将调制掺杂的Ge量子点用于改进红外探测器的应用。

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