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Effect of Surface Treatments in Nanocrystalline Silicon

机译:表面处理对纳米晶硅的影响

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摘要

Exposure to ammonia (NH_3) increases the dark current (DC) in porous silicon (PS), but evaporated selenium (Se) deposited on PS decreases DC. Photoluminescence (PL) measurement shows that there are two types of centers. PL in one region of PS (Peak ~ 800nm) initially increases with the NH_3 exposure and then decreases. But the PL from another region of PS has a peak at ~780nm and it decreases continuously with the NH_3 exposure. Dipping PS in water and drying in air shifts the PL peak at 800 nm to 744 nm. Atomic Force Microscopy (AFM) shows that the as prepared sample has wires of diameters 2.4nm, 3.4nm, 4.6nm and bigger. However, in the AFM images of the water treated sample the wires of diameters 3.4nm and 4.6nm are absent. The PL results are explained using the AFM data and the John-Singh model of quantum confinement.
机译:暴露于氨水(NH_3)会增加多孔硅(PS)中的暗电流(DC),但沉积在PS上的蒸发硒(Se)会降低DC。光致发光(PL)测量表明存在两种类型的中心。 PS的一个区域(峰值〜800nm)中的PL首先随着NH_3暴露而增加,然后降低。但是来自PS另一区域的PL在〜780nm处有一个峰值,并且随着NH_3的暴露而连续降低。将PS浸入水中并在空气中干燥会将PL峰从800 nm移至744 nm。原子力显微镜(AFM)显示,所制备的样品具有直径为2.4nm,3.4nm,4.6nm和更大的导线。但是,在水处理过的样品的AFM图像中,没有直径为3.4nm和4.6nm的导线。 PL结果使用AFM数据和John-Singh量子约束模型进行解释。

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