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Simulation of high performance quantum well GaN-based LED

机译:高性能量子阱GaN基LED的仿真

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The performance of quantum well GaN/AlGaN light emitting diode (LED) is reviewed for three different barriercompositions; symmetric barrier composition with low Al content, asymmetric barrier composition with higher Alcontent on p-type cladding layer and lower Al content on n-type cladding layer, and symmetric barrier composition withhigher Al content. The study was conducted using ATLAS/BLAZE & LUMINOUS software developed by SilvacoInternational Inc. Integrated radiative recombination rate was studied on applied voltages up to 5V. Results showedthree phases of LED performance with different applied voltages and these were explained using bandgap theory. I-Vcharacteristic for each design agrees with the total additional voltage drop equation for a quantum well structure. Thedominant radiative recombination rate regions in LED at low and high supplied voltages are also presented for the bestperformance LED design.
机译:回顾了三种不同势垒成分的量子阱GaN / AlGaN发光二极管(LED)的性能。 Al含量低的对称阻挡层组成,p型覆盖层上的Al含量高,n型覆盖层上的Al含量低的不对称阻挡层组成,Al含量高的对称式阻挡层组成。该研究使用SilvacoInternational Inc.开发的ATLAS / BLAZE&LUMINOUS软件进行。研究了在最高5V的施加电压下的综合辐射复合率。结果显示了在不同施加电压下LED性能的三个阶段,并使用带隙理论对其进行了解释。每个设计的I-V特性与量子阱结构的总附加压降方程式一致。还介绍了低和高供电电压下LED的主要辐射复合率区域,以实现最佳性能的LED设计。

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