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Light Emission from Si LED Controlling by a Gate Voltage and SOS Tunneling Junction

机译:Si LED的发光由栅极电压和SOS隧穿结控制

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A novel Si LED with three terminals has been designed and fabricated compatible completely with standard n-well CMOS technology. It is composed by a combination of a forward biased p~+-n junction controlling by gate voltage and a poly-Si/ultrathin oxide/Si tunneling junction. The experimental results demonstrates that: (1)The optical emitting power of LED increases with both forward p~+-n junction current increasing and positive gate voltage increasing; (2) The optical emitting power of LED still increases with gate Voltage increasing while p~+-n junction forward current at zero; (3) The spectra of the optical output power on wavelength X occurs a peak near 1000nm. The results can be explained from the enhancement on the p-n junction forward current by the gate voltage induced barrier lowering effect and the S(poly-Si)OS tunneling junction theory.
机译:已经设计和制造了具有三个端子的新型Si LED,该LED与标准n阱CMOS技术完全兼容。它由受栅极电压控制的正向偏置p〜+ -n结与多晶硅/超氧化物/硅隧穿结的组合组成。实验结果表明:(1)LED的光发射功率随着正向p〜+ -n结电流的增加和正栅极电压的增加而增加; (2)当p〜+ -n结正向电流为零时,LED的发光功率仍随栅极电压的增加而增加; (3)在波长X上的光输出功率的光谱在1000nm附近出现一个峰值。可以通过栅极电压引起的势垒降低效应和S(poly-Si)OS隧穿结理论增强p-n结正向电流来解释结果。

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