GE Corporate Research and Development, Schenectady, NY 12301;
GE Corporate Research and Development, Schenectady, NY 12301;
GE Corporate Research and Development, Schenectady, NY 12301;
GE Corporate Research and Development, Schenectady, NY 12301;
GE Corporate Research and Development, Schenectady, NY 12301;
GE Corporate Research and Development, Schenectady, NY 12301;
GE Corporate Research and Development, Schenectady, NY 12301;
机译:平面6H-SiC ACCUFET:新型高压功率MOSFET结构
机译:基于硅离子注入的增强型和耗尽型MOSFET组成的基于GaN的单片反相器
机译:使用通过卤化物气相外延生长的Ga_2O_3同质外延膜制造的耗尽型垂直Ga_2O_3沟槽MOSFET
机译:平面耗尽模式6H-SIC MOSFET
机译:建模平面和非平面MOSFET的外部电阻和电容
机译:P型门 - 全面硅纳米线MOSFET的低温传输特性
机译:漏电流漂移和磁滞可忽略不计的亚微米耗尽型GaAs MOSFET演示
机译:使用耗尽型mOsFET的电阻元件。