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Bulk crystals, thin films and devices of the wide band gap semiconductors of silicon carbide and the Ⅲ-Ⅴ nitrides of aluminum, gallium and indium

机译:碳化硅和铝,镓和铟的Ⅲ-Ⅴ族氮化物的宽带隙半导体的块状晶体,薄膜和器件

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The extremes in the thermal and electronic properties of SiC and the III-V nitrides of B, Al, Ga and In allow the types and the numbers of present and conceivable device applications in these materials to be substantial. Single crystal boules and wafers of the 6H- and 4H-SiC polytypes have been produced. However, micropipes and related defects cause device degradation. Molecular beam and atomic layer epitaxial thin film growth techniques and new devices have recently been reported. GaN continues to be heavily investigated; however, n- and p-type doping and alloys with A1N and InN and associated heterostructures are now being studied to produce blue LEDs. Recent developments, current problems and required materials research are discussed in the following sections.
机译:SiC和B,Al,Ga和In的III-V氮化物的热学和电子学特性极高,这些材料中目前存在的和可想到的器件应用的类型和数量非常重要。已经生产出6H-和4H-SiC多型的单晶圆棒和晶片。但是,微管和相关缺陷会导致设备性能下降。最近已经报道了分子束和原子层外延薄膜生长技术和新装置。 GaN继续受到广泛研究;然而,目前正在研究具有AlN和InN及其相关异质结构的n型和p型掺杂以及合金,以生产蓝色LED。以下各节讨论了最新的发展,当前的问题和所需的材料研究。

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