Institute of Solid State.Physics, 72, Tsarigradsko Chaussee, 1784 Sofia, Bulgaria;
amorphous chalcogenide Ge_(19)Sb_1Te_(80) films; vacuum thermal evaporation; spectral ellipsometry; optical constants; illumination; photo-induced changes; optical bandgap energy;
机译:非晶Ge_(20)Se_(80)和Ag_6(Ge_(0.20)Se_(0.80))_(94)薄膜的光学性质
机译:退火和厚度对Ge_(20)Te_(80)和Cu_6Ge_(14)Te_(80)薄膜的光吸收的影响
机译:在无定形GE_(24)SE_(61)SB_(15)SB_(15)SB_(15)薄膜下的80 MEV硅SWIFT重离离子进行电信和光学应用
机译:硫齐甲醚GE_(19)SB_1TE_(80)膜的光学常数的光学常数变化
机译:核磁共振研究:第一部分。Fluorine-19自旋-自旋耦合常数。第二部分溶剂对Fluorine-19自旋偶联常数的影响
机译:ALD制备的亚20纳米厚TiO2薄膜的光学常数和带隙演化及相变
机译:纳米结构超导Mo_ <80> Ge_ <20>薄膜的涡旋分布
机译:用于光学存储器的(pb,La)(Zr,Ti)O(sub 3)薄膜的光致和电光特性。