Measurement of the Mueller matrix of an elliptical-mirror scatterometer

摘要

We have recently developed a scatterometer which uses an elliptical mirror to direct the light scattered from a rough surface onto a CCD camera. This scatterometer is faster than the traditional arm based devices, and can measure the bi-dimensional scatter pattern. In the present work we present results for the calculation of the Mueller matrix of the elliptical mirror with the aim of using this information to correct the measured Mueller matrix for the instrumental contribution, to obtain the Mueller matrix of the scattering process.