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Self-aligned molecular beam epitaxy of CdZnTe for IR focal plane arrays

机译:CdZnTe自对准分子束外延用于红外焦平面阵列

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Abstract: The crystallographic orientation of Cd$-1$MIN@x$/Zn$-x$/Te (x $APEQ 0.045) grown by molecular beam epitaxy (MBE) on a clean (planar) (100) GaAs surface can be controlled by the proper choice of the GaAs surface stoichiometry. An As-stabilized surface initiates (100) oriented growth, while the Ga-stabilized surface yields (111) oriented growth. Cd$- 1$MIN@x$/Zn$-x$/Te (x $APEQ 0.045) MBE layers grown in recesses of shadow masked patterned (100) GaAs substrates were found to be in the (100) orientation regardless of whether precursor surfaces were stabilized with Ga or As. The epitaxial layer's orientation and optical properties were determined by backscattered electron channeling and low temperature photoluminescence measurements, respectively. CdZnTe layers grown in recesses showed improved optical features as compared to the layers grown on planar substrates. !21
机译:摘要:通过分子束外延(MBE)在干净的(平面)(100)GaAs表面上生长的Cd $ -1 $ MIN @ x $ / Zn $ -x $ / Te(x $ APEQ 0.045)的晶体取向可以是通过适当选择GaAs表面化学计量来控制。 As稳定化的表面开始(100)定向生长,而Ga稳定化的表面产生(111)定向生长。发现Cd $ -1 $ MIN @ x $ / Zn $ -x $ / Te(x $ APEQ 0.045)生长在阴影掩膜的图案化(100)GaAs衬底凹槽中的MBE层处于(100)方向前驱体表面用Ga或As稳定。外延层的取向和光学性质分别通过背散射电子沟道和低温光致发光测量来确定。与在平面基板上生长的层相比,在凹槽中生长的CdZnTe层显示出改进的光学特性。 !21

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