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Design and characterization of Avalanche Photodiodes in submicron CMOS technologies

机译:亚微米CMOS技术中雪崩光电二极管的设计与表征

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摘要

The fabrication of Avalanche Photodiodes (APDs) in CMOS processes can be exploited in several application domains, including telecommunications, time-resolved optical detection and scintillation detection. CMOS integration allows the realization of systems with a high degree of parallelization which are competitive with hybrid solutions in terms of cost and complexity. In this work, we present a linear-mode APD fabricated in a 0.15μm process, and report its gain and noise characterization. The experimental observations can be accurately predicted using Hayat dead-space noise model. Device simulations based on dead-space model are then used to discuss the current status and the perspectives for the integration of high-performance low-noise devices in standard CMOS processes.
机译:CMOS工艺中的雪崩光电二极管(APD)的制造可以在多个应用领域中加以利用,包括电信,时间分辨光学检测和闪烁检测。 CMOS集成可实现高度并行化的系统,在成本和复杂性方面,它们可与混合解决方案竞争。在这项工作中,我们介绍了采用0.15μm工艺制造的线性模式APD,并报告了其增益和噪声特性。使用Hayat死区噪声模型可以准确地预测实验观察结果。然后使用基于死空间模型的器件仿真来讨论当前状态以及在标准CMOS工艺中集成高性能低噪声器件的前景。

著录项

  • 来源
    《Optical components and materials XI》|2014年|898211.1-898211.8|共8页
  • 会议地点 San Francisco CA(US)
  • 作者单位

    DII, University of Trento, Via Sommarive, 5, 38123 Trento, Italy;

    DII, University of Trento, Via Sommarive, 5, 38123 Trento, Italy,LEA, Department of Electronics, University of Batna, Batna 05000, Algeria;

    DII, University of Trento, Via Sommarive, 5, 38123 Trento, Italy;

    Fondazione Bruno Kessler, Via Sommarive, 18, 38123 Trento, Italy;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Avalanche Photodiode; Photodetector; CMOS technology;

    机译:雪崩光电二极管;光电探测器CMOS技术;

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