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Tensile strained III-V self-assembled nanostructures on a (110) surface

机译:(110)表面上的拉伸应变III-V自组装纳米结构

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The vast majority of research on epitaxial quantum dots use compressive strain as the driving force for self-assembly on the (001) surface, with InAs/GaAs(001) and Ge/Si(001) being the best-known examples. In this talk, I will discuss our work on determining the feasibility of growing coherent, tensile-strained III-V nanostructures on a (110) surface. GaP on GaAs(l 10) was chosen as an initial test system. It is hoped that our efforts on self-assembled, tensile-strained dots on a (110) surface will lead the way to new devices exploiting the fundamental differences between the (110) and (001) surfaces. Furthermore it is anticipated that this work will form the first step towards a more general description of self-assembled nanostructure growth under tensile strain.
机译:关于外延量子点的绝大多数研究都使用压缩应变作为在(001)表面自组装的驱动力,其中InAs / GaAs(001)和Ge / Si(001)是最著名的例子。在本演讲中,我将讨论确定在(110)表面上生长相干,拉伸应变的III-V纳米结构的可行性的工作。选择GaAs(l 10)上的GaP作为初始测试系统。希望我们对(110)表面上的自组装,拉伸应变点的努力将引导利用(110)和(001)表面之间的根本差异的新设备。此外,可以预期,这项工作将成为迈向对拉伸应变下自组装纳米结构生长进行更一般描述的第一步。

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