Low Cost PMMA based photo-masks for 3D grey scale micro-structuring applications

摘要

The transfer of a three dimensional grey-scale pattern from a polymer composite to a photoresist has been demonstrated. The grey scale structure was fabricated using variable dose electron beam lithography. The optical transparency of the electron beam resist was reduced by the addition of Al_2O_3 and TiO_2 nanoparticles. The reduction in optical transparency of this composite was due to the radiation scattering effects of the poly crystalline nanoparticles. By increasing the nanoparticle density, the overall transparency of the composite is reduced.