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Use of Ti-Doped Hafnia in Photovoltaic Devices: Ab Initio Calculations

机译:在光伏器件中使用Ti-Doped Hafnia:AB Initio Calculation

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Optical response of Ti-doped (50%) hafnia (HfO_2) has been studied, using first-principles calculations within the framework of density functional theory, to explore the feasibility of doped hafnia in photovoltaics. Density of states (DOS) of hafnia and doped hafnia are also presented to understand the role of Ti doping in reducing the bandgap of the base material from 5.77 to 2.33 eV leading to its applications in photovoltaic devices and UV detectors. Various optical properties like frequency-dependent dielectric constants and absorption coefficients are explained.
机译:研究了Ti-Doped(50%)Hafnia(HFO_2)的光学响应,在密度函数理论框架内使用了第一原理计算,探讨了掺杂Hafnia在光伏中的可行性。还提出了Hafnia和掺杂Hafnia的状态(DOS)的密度,以了解TI掺杂在将基材与5.77至2.33eV的带隙降低到光伏器件和UV探测器中的应用。解释了各种依赖介质介质常数和吸收系数的光学性质。

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