Elastic Response of 10-nm Insulator Films Measured by Dynamic Indentation for Nano-scale Electron Device Fabrication

摘要

This work addresses nanoscale measurements of mechanical properties of ultra-thin insulator films by a dynamic indentation atomic force microscopy (DI-AFM). The ability of the DI-AFM is discussed to clarify some challenges in quantitative evaluation of stiffness and elastic modulus of 10 nm films on Ge and S.i.