Chemical nickel plating on a SiO2 film of the silicon betavoltaic converter active window

摘要

In this work, nickel thin films were deposited on silicon and silicon dioxide by chemical deposition for creation a nickel-63 isotope beta radiation source on the active window of a silicon betavoltaic converter. The effects the samples pre-treatment and the process parameters on the nickel deposits quality were investigated. The practical recommendations for implementation of nickel plating and reuse of processed electrolytes are given.