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Ferroelectric Property and Microstructures of La-doped Bi_4Ti_3O_(12) Thin Films

机译:La-Doped Bi_4ti_3O_(12)薄膜的铁电性能和微观结构

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La-doped bismuth titanate (Bi_(4_x)La_xTi_3O_(12): BLT) and pure Bi_4Ti_3O_(12) (BIT) thin films with random orientation were fabricated on Pt/Ti/SiCVSi substrates by rf magnetron sputtering technique. These samples had polycrystalline Bi-layered perovskite structure without preferred orientation, and consisted of well developed rod-like grains with random orientation. For the samples with x=0.25 and 1.0 the current-voltage characteristics exhibited negative differential resistance behaviors and their P-V hysteresis loops were characterized by large leakage current, whereas for the samples with x=0.5 and 0.75 the current-voltage characteristics showed simple ohmic behaviors and their P-V hysteresis loops were the saturated and undistorted hysteresis loops. The remanent polarization (P_r) and co ercive field (E_c) of the BLT ceramic with x=0.75 were above 20μC/cm~2 and 85KV/cm, respectively.
机译:通过RF磁控溅射技术,在PT / TI / SICVSI基板上制造具有随机取向的LA掺杂的钛酸铋(BI_(4_X)LA_XTI_3O_(12):BLT)和纯BI_4TI_3O_(12)(位)薄膜。这些样品具有没有优选取向的多晶双层钙钛矿结构,并且由具有随机取向的良好发育的杆状晶粒组成。对于具有X = 0.25和1.0的样品,电流 - 电压特性表现出负差分电阻行为,并且其PV磁滞回路的特征在于漏电流大,而具有X = 0.5和0.75的样品,电流 - 电压特性显示出简单的欧姆行为它们的PV滞后环是饱和和未变形的滞后环。具有X = 0.75的BLT陶瓷的剩磁极化(P_R)和CO ercive励磁场(E_C)分别高于20μC/ cm〜2和85kV / cm。

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