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Electron Beam Evaporation of Alumina Ceramics at Forevacuum Pressure Range

机译:氧化铝陶瓷在锻造压力范围内的电子束蒸发

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We describe the electron beam evaporation of aluminum oxide ceramic in the pressure range of 5-15 Pa using the forevacuum plasma electron source. In the irradiation of an ceramic target by an electron beam in the fore-vacuum pressure range, the target potential is much lower than the electron beam energy, offering the possibility of direct electron evaporation of insulating ceramic materials. The speed of ceramic evaporation was 4 g/h, while the electron beam power density of 10 kW/cm~2. These results open the possibility of effective application of ceramic coatings on the basis of electron-beam technologies in the forevacuum pressure range.
机译:我们描述了使用Forevuum等离子体电子源在5-15Pa的压力范围内的氧化铝陶瓷的电子束蒸发。在前真空压力范围内的电子束照射陶瓷靶的照射中,目标电位远低于电子束能量,提供了直接电子蒸发绝缘陶瓷材料的可能性。陶瓷蒸发的速度为4g / h,而电子束功率密度为10kW / cm〜2。这些结果开启了在不可扫描压力范围内的电子束技术的基础上有效地应用陶瓷涂层的可能性。

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