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Nickel sulfide sensitized TiO_2 nanotubes system as photo-anode: Will this system active under visible light and why

机译:硫化镍敏化TiO_2纳米管系统作为光阳极:该系统是否在可见光下活跃,为什么

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This work is dedicated to enhance the photo catalytic activity of the modified 2 nanotube under visible light exposure. The narrow band gap of semiconductor such as NiS can be incorporated onto TiO_2 nanotube (NiS/TiO_2-NT) to obtain a composite which may active under visible light. The TiO_2 nanotube was self-prepared by electro-oxidation of titanium plate in electrolyte containing ethylene glycol, NH4F, and water. Meanwhile, the incorporation of NiS onto TiO_2 film was prepared by successive ionic layer absorption and reaction (SILAR) method, in which nickel(II) ion and sulfide ion were used as the precursor of NiS, to obtain the NiS/TiO_2-NT film system. The obtained NiS/TiO_2-NT films were characterized by UVDRS, FTIR, SEM, XRD, and photo-electro-chemical work station. The resultsindicated that the peak of absorption spectra of NiS/TiO_2-NT fall within thevisible light region, which the final band gap was 2.85 eV; IR and XRD spectra were also revealed the characteristic peak of NiS/TiO_2-NT system. Photo-electrochemical investigation revealed that the evolution of photocurrent under visible light (100 W wolfram lamp), as much as 0.26 mA/cm~2 typically can be easily observed.
机译:这项工作是致力于提高在可见光下曝光改性2纳米管的光催化活性。半导体的带隙窄如NIS可以结合到纳米管的TiO_2(NIS /的TiO_2-NT),以获得复合其可以在可见光下活性。所述纳米管的TiO_2呈自制备通过在含有乙二醇,NH 4 F,水和电解质钛板的电氧化。同时,硫化镍的到的TiO_2膜掺入物通过连续离子层吸附和反应(SILAR)方法制备,其中镍(II),使用离子和硫化物离子如NIS的前体,以获得NIS /的TiO_2-NT膜系统。通过UVDRS,FTIR,SEM,XRD和光 - 电 - 化学工作站所得到的NIS /的TiO_2-NT膜进行了表征。所述resultsindicated该NIS /的TiO_2-NT的吸收光谱的峰值下降thevisible光区域,其中最终的带隙为2.85电子伏特范围内; IR和XRD谱还表明NIS /的TiO_2-NT系统的特征峰。光电化学的调查显示,在可见光下(100瓦钨灯)光电流的演变,尽可能多0.26毫安/平方厘米〜2通常可以容易地观察到。

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