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Analysis of 2T 1D memory cell with various active capacitors

机译:用各种有源电容器分析2T 1D存储器单元

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In this paper two transistor DRAM cell forms with one diode have been designed and analyzed. Insertion of diode in the memory cell fulfils the requirements of a capacitor to get improvisation in memory read and write operation. Both nmos and pmos transistors are used to implement two types of storage capacitors i.e. gate and junction. Concerned cells are compared on the basis of their read access time, write access time, retention time and power dissipation. All design and simulation work has been performed on Tanner EDA tool.
机译:在本文中,设计并分析了两个具有一个二极管的晶体管DRAM单元格式。在存储器单元中插入二极管满足电容器的要求,以在内存读写操作中获得即兴创作。 NMOS和PMOS晶体管都用于实现两种类型的存储电容器I.E.TEATE。将有关细胞基于其读访问时间,写入访问时间,保留时间和功耗进行比较。所有设计和仿真工作都已在Tanner EDA工具上执行。

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