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Analysis of 2T 1D memory cell with various active capacitors

机译:具有各种有源电容器的2T 1D存储单元分析

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摘要

In this paper two transistor DRAM cell forms with one diode have been designed and analyzed. Insertion of diode in the memory cell fulfils the requirements of a capacitor to get improvisation in memory read and write operation. Both nmos and pmos transistors are used to implement two types of storage capacitors i.e. gate and junction. Concerned cells are compared on the basis of their read access time, write access time, retention time and power dissipation. All design and simulation work has been performed on Tanner EDA tool.
机译:在本文中,已经设计和分析了具有一个二极管的两种晶体管DRAM单元形式。在存储单元中插入二极管可以满足电容器的要求,从而可以简化存储的读写操作。 nmos和pmos晶体管均用于实现两种类型的存储电容器,即栅极和结。根据相关单元的读取访问时间,写入访问时间,保留时间和功耗进行比较。所有设计和仿真工作均已在Tanner EDA工具上执行。

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