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Growth Feature of Diamond-Like Carbon Films by Various Vacuum Plasma Methods

机译:各种真空等离子体法的菱形碳膜膜的生长特征

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Diamond-like carbon (DLC) films were prepared on silicon substrate using four different vacuum plasma methods: magnetron sputtering (MS), pulse laser ablation (PLA), ion beam deposition (IBD) and pulse cathode vacuum arc evaporation (CVAE). The microstructure, surface morphology and optical properties of the DLC films were investigated by Raman spectroscopy, atomic force microscope (AFM) and UV-visible spectrophotometer. The results showed that the films prepared by different vacuum plasma methods varied in the microstructure. The film prepared by CVAE possessed the smallest grain size of graphite with the highest disordering of Csp2 clusters, while more disordered Csp2 clusters presented in the DLC film due to the high ions energy density during PLA. Meanwhile, the deposition methods mainly affected the size of particles and roughness of the DLC films under the same thickness. The film by PLA shows a quite smooth surface structure with uniform particle size. In terms of the optical properties, the films prepared by magnetron sputtering expressed the best optical performance among the four vacuum plasma methods.
机译:使用四种不同的真空等离子体方法在硅衬底上制备金刚碳碳(DLC)膜:磁控溅射(MS),脉冲激光烧蚀(PLA),离子束沉积(IBD)和脉冲阴极真空弧蒸发(CVAE)。通过拉曼光谱,原子力显微镜(AFM)和UV可见分光光度计研究了DLC膜的微观结构,表面形态和光学性质。结果表明,通过不同的真空等离子体方法制备的薄膜在微观结构中变化。 CVAE制备的薄膜具有最小的石墨的晶粒尺寸,具有最高的CSP2簇,而在PLA期间的高离子能量密度,在DLC膜中呈现的更多无序的CSP2簇。同时,沉积方法主要影响在相同厚度下DLC膜的颗粒尺寸和粗糙度。 PLA的薄膜显示出具有均匀粒度的相当光滑的表面结构。就光学性质而言,通过磁控溅射制备的薄膜在四种真空等离子体方法中表达了最佳光学性能。

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