ENHANCED PHOTOELECTROCHEMICAL WATER SPLITTING ON HEMATITE THIN FILM WITH ULTRATHIN SIO2 UNDER LAYER

摘要

Hematite is attractive materials for photoelectrohemical water splitting because of its high chemical stability in aqueous solution, suitable valance band position, low cost and photoactivity under the visible light. However, the drawbacks of short diffusion length, high electron-hole recombination rate and low rate constant for water oxidation. These drawbacks limit the photoelectrochemical conversion efficiency of hematite. Recent work reports that introducing thin under layer can lead dramatic enhancement of solar water splitting efficiency of hematite thin film. The thickness of under layer is critical for the efficiency of hematite films. So, we introduce thin silica layer between fluorine doped tin oxide (FTO) and hematite film getting high photoelectrochemical water splitting efficiency.