Study on the Influence of N-Doping to the In-situ Growth TiO_2 Film Photocatalytic Character

摘要

Thin TiO_2 films in-situ growth on titanium alloy substrate were prepared in 0.05 mol/L H_2SO_4 electrolyte using the micro plasma oxidation method. The photocatalytic properties of the prepared thin TiO_2 films were invested using Rhodamine B solution as a target pollutant. In order to improve the photocatalytic properties of the obtained TiO_2 films, different content NH_3-H_2O was added into the H_2SO_4 electrolyte and obtained the N-doped TiO_2films photocatalyst. The influence of the doping ions on the crystal phase composition and microstructure of the TiO_2 films were investigated by scanning electron microscopy (SEM) and X ray photoelectron spectroscopy (XPS). The results show that TiO_2 films have uniformly grown closely on the surface of titanium substrate with pore size of 100-200 um. The degradation efficiency of the TiO_2 thin film prepared in H_2SO_4 + NH_3-H_2O is higher than that prepared with H_2SO_4, the degradation efficiency can reach 99% after 75 min, which increase about 10% than that of the H_2SO_4 eletrolyte.