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Electroluminescence and Photoluminescence Properties of Porous Silicon Nanostructures with Optimum Current Density of Photo-Electrochemical Anodisation

机译:多孔硅纳米结构具有最佳电气化学散热度的多孔硅纳米结构的电致发光和光致发光性能

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P-type silicon wafer (<100> orientation; boron doping; 0.75~10 Ω cm~(-1)) was used to prepare samples of porous silicon nanostructures (PSiNs). All samples have been prepared by using photo-electrochemical anodisation. A fixed etching time of 30 minutes and volume ratio of electrolyte, hydrofluoric acid 48% (HF48%) and absolute ethanol (C_2H_5OH), 1:1 were used for various current densities, J. There were sample A (J=10 mA/cm~2), sample B (J=20 mA/cm~2), sample C (J=30 mA/cm~2), sample D (J=40 mA/cm~2) and sample E (J=50 mA/cm~2). Photoluminescence (PL) and electroluminescence (EL) spectra were investigated. Maximum peak position of PL spectrum at about ~675 nm, while the maximum EL spectrum at about ~650 nm (which is similar to the PL spectrum).
机译:p型硅晶片(<100>取向;硼掺杂; 0.75〜10Ωcm〜(-1))用于制备多孔硅纳米结构的样品(psins)。所有样品都是通过使用光电化学散发来制备的。电解质,氢氟酸48%(HF48%)和绝对乙醇(C_2H_5OH),1:1的固定蚀刻时间用于各种电流密度,J.存在样品A(J = 10mA / Cm〜2),样品B(J = 20mA / cm〜2),样品C(J = 30mA / cm〜2),样品D(J = 40mA / cm〜2)和样品e(j = 50 ma / cm〜2)。研究了光致发光(PL)和电致发光(EL)光谱。 PL光谱的最大峰值位置约为675nm,而大约650nm的最大EL光谱(其类似于PL光谱)。

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