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Structural And Optical Characterization Of Zinc Telluride Thin Films

机译:碲化锌薄膜的结构和光学表征

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Group II- VI compounds have been investigated largely in last two decades due to their interesting optoelectronic properties. ZnTe, a member of this family, possesses a bandgap around 2.26 eV. This material is now a day investigated in thin film form due to its potential towards various viable applications. In this paper, the authors report their investigations on the preparation of ZnTe thin films using vacuum evaporation technique and their structural and optical characterizations. The structural characterization, carried out using an X-ray diffraction (XRD) technique shows that ZnTe used in present case possesses a cubic structure. Using the same data, the micro strain and dislocation density were evaluated and found to be around 1.465×10~(-3) lines-m~2 and 1.639×10~(15) lines/m~2 respectively. The optical characterization carried out in UV-VIS-NIR region reveals the fact that band gap of ZnTe is around 2.2 eV in present case. In addition to this, it was observed that the value of bandgap decreases as the thickness of films increases. The direct transitions of the carries are involved in ZnTe. Using the data of UV-VIS-NIR spectroscopy, the transmission coefficient and extinction coefficient were also calculated for ZnTe thin films. Besides, the variation of extinction coefficient with wavelength has also been discussed here.
机译:由于其有趣的光电性质,II-VI组化合物在最近二十年内被调查。这个家庭成员的Znte拥有2.26eV的带隙。由于其对各种可行性应用的潜力,这种材料现在是薄膜形式进行的一天。在本文中,作者报告了使用真空蒸发技术及其结构和光学表征对ZnTe薄膜制备的研究。使用X射线衍射(XRD)技术进行的结构表征表明,本案例中使用的ZnTe具有立方结构。使用相同的数据,评估微菌株和位错密度,发现分别为1.465×10〜(-3)线-M〜2和1.639×10〜(15)线/ m〜2。在UV-Vis-NIR区域中进行的光学表征揭示了当前情况下ZnTe的带隙约为2.2eV的事实。除此之外,观察到带隙的值随着薄膜的厚度增加而降低。携带的直接转换涉及Znte。使用UV-Vis-Nir光谱的数据,还针对ZnTe薄膜计算了透射系数和消光系数。此外,这里还讨论了具有波长的消光系数的变化。

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