SEMATECH's Lithography Program Enabling Solutions through Collaboration - (PPT)

摘要

Collaboration is the key towards enabling the Lithography Roadmap: Collaboration on infrastructure development and pre-competitive research is becoming the norm and not the exception; Cost, complexity, and the risk associated with major technology transitions in the industry - like EUV - drive new collaboration models such as e.g. EMI-like programs; Collaboration at consortia like SEMATECH has expanded to include all elements of the lithography supply chain - in equal partnerships rather than in traditional supplier customer relationships (resist and materials research, tool access for suppliers).