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Study on Ni/Al Interface Diffusion at Initial Time by Using Molecular Dynamics Method

机译:用分子动力学方法研究初始时间的Ni / Al界面扩散

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The basic theory of molecular dynamics and interface diffusion theory are used to simulate metal Ni/Al interface diffusion. The position image of the interface diffusion atoms and radial distribution function curve of Ni/Al interface reaction at initial time at a high temperature can be got. Through these images of diffusion atoms position, it is observed that there is a lot of change during the simulation process. The Al atoms layer of the matrix begins to melt at first. Ni atoms in the matrix begin to diffuse outward rapidly in large quantities. Al atoms overall diffuse to one side of the matrix at a relatively low speed, inter-diffusion layer thickness increases continuously and inter-diffusion atoms are solidified gradually from one side of the matrix to the surface. The process of change has been further verified in the corresponding radial distribution function curves. These conclusions can provide a theoretical reference for the technology of new materials preparation and the expansion of the environment of Ni/Al use.
机译:分子动力学和界面扩散理论的基本理论用于模拟金属Ni / Al界面扩散。可以得到界面扩散原子的位置图像和高温下初始时间的Ni / Al界面反应的径向分布函数曲线。通过这些漫射原子位置的这些图像,观察到在模拟过程中存在大量变化。基质的Al原子层首先开始熔化。基质中的Ni原子开始以大量快速地扩散。 Al原子以相对低的速度将基质的一侧扩散到基质的一侧,连续扩散层厚度增加,并且扩散原子逐渐从基质的一侧逐渐凝固到表面。在相应的径向分布函数曲线中进一步验证了变化过程。这些结论可以为新材料制备技术和Ni / Al使用环境的扩展提供理论参考。

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