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Study on properties and preparation of films by Unbalanced Magnetron Sputtering

机译:不平衡磁控溅射的性能及薄膜制备研究

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TiAlN films were prepared by closed field Unbalanced Magnetron Sputtering ion plating. EDS, XRD and SEM were used to test the films' chemical composition, microstructure and surface morphology. In addition, the films' surface microhardness, bonding strength and friction coefficient were also determined. The experimental results indicate that the TiAlN films of different substrate hardness have dense film structure and the same chemical composition, the hard substrate microhardness of the film can reach 2575 HV_(0.025) and soft substrate can be up to 2295 HV_(0.025), the bonding strength of which is respectively 59N and 56N, Friction coefficient is 0.45 and 0.5.
机译:通过封闭的场不平衡磁控溅射离子电镀制备TiAln薄膜。 EDS,XRD和SEM用于测试薄膜的化学成分,微观结构和表面形态。另外,还确定了膜表面显微硬度,粘合强度和摩擦系数。实验结果表明,不同衬底硬度的TiAln薄膜具有致密的膜结构和相同的化学组成,膜的硬质底物显微硬度可达到2575 HV_(0.025),软基材可达2295 HV_(0.025),粘合强度分别为59N和56N,摩擦系数为0.45和0.5。

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