首页> 外文会议>SEMATECH Surface Preparation and Cleaning Conference >Removal of UV cured resin mold on quartz using UV/03 cleaning for Nanoimprinting Lithography (PPT)
【24h】

Removal of UV cured resin mold on quartz using UV/03 cleaning for Nanoimprinting Lithography (PPT)

机译:使用UV / 03清洁除去石英紫外线固化树脂模具,用于纳米压印光刻(PPT)

获取原文

摘要

1. UV/O3 cleaning and DIO3 cleaning process are very effective in removing bulk resin 2. Resin residues and particles are completely removed by SC-1 final cleaning process → Contact angle is hydrophilic (< 10°) 3. Hybrid(UV/O3, DIO3, SC-1) cleaning process can replace SPM cleaning in UV-cured resin removal 4. Acknowledgments This work has been supported by 5. Samsung Advanced Institute of Technology (SAIT) 6. Post BK21 program.
机译:1. UV / O3清洁和DIO3清洁过程在除去散装树脂中非常有效2.通过SC-1最终清洁过程完全除去树脂残留物和颗粒→接触角是亲水性(<10°)3。杂交(UV / O3 ,DIO3,SC-1)清洁过程可以取代紫外线固化树脂的SPM清洁。致谢这项工作得到了5.三星高级理工学院(SAIT)6. BK21职位。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号