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Preparation of Ta-Ti co-doped VO_2 polycrystal thin film with High resistance temperature coefficient and without hysteresis

机译:具有高电阻温度系数的Ta-Ti共掺杂VO_2多晶薄膜的制备,缺乏滞后

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Using vanadyl acetylacetonate (C_(10)H_(14)O_5V) as precursor, use Tantalum Ethoxide (Ta(OC_2H_5)_5) and Tetrabutyl titanate (C_(16)H_(36)O_4Ti)as doper, by sol-gel method fabricate Ta, Ti mono doping and Ta-Ti co-doped V_(1-x-y)Ta_xTi_yO_2 thin film. XRD spectrum indicated that the film was oriented in (011) direction. XPS results indicated the valence state of V, Ta, Ti in the film is +4, at all. While Ta mono doping, single 1at.%Ta can deduce the phase transiton temperature (T_t) by 7.8°C, phase transition hysteresis (ΔT) by 1°C. When the doping rate is 6at.%, T_t=22°C, ΔT=1°C. Ti dopings has little affection to Tt but deduceΔT obviously. Ta-Ti co-doped V_(0.93)Ta_(0.06)Ti_(0.01)O_2 film thin films without phase transition hysteresis were also fabricated, and its TCR is as high as -7.58%/K at 25°C.
机译:使用乙酰乙酰乙酸酯(C_(10)H_(14)O_5V)作为前体,用溶胶 - 凝胶法制造钽乙氧烷(TA(OC_2H_5)_5)和四丁酯(C_(16)H_(36)O_4TI),通过溶胶 - 凝胶法制造TA,TI单声道掺杂和TA-TI共掺杂V_(1-XY)TA_XTI_YO_2薄膜。 XRD光谱表明,薄膜在(011)方向上取向。 XPS结果表明,薄膜中V,TA,Ti的价状态为+4,根本。虽然TA单声道掺杂,单1AT。%TA可以将相转移温度(T_T)达到7.8°C,相位过渡滞后(ΔT)1°C。当掺杂率为6at时。%,T_T = 22°C,ΔT= 1°C。 TI掺杂对TT几乎没有感情,但显然迈出了Δt。 TA-TI共掺杂V_(0.06)TA_(0.06)TI_(0.01)O_2 O_2膜薄膜,没有相位过渡滞后,其TCR在25℃下高达-7.58%/ k。

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