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Analysis of The Surface Shape Effect on Optical Homogeneity Measurement of Large Calibre Optical Materials

机译:大口径光学材料光学均匀测量的表面形状效应分析

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Optical homogeneity of the optical materials directly affects the wavefront quality of the refractive optical system. As the traditional direct measurement method requires high precision surface shape machining for optical material(PV value < 0.1 λ,), it was gradually replaced by the method of Fizeau interferometer four step, which requires lower surface shape. This article used 600mm diameter Fizeau interferometer, a four step method tested the optical homogeneity of the same 500 mm diameter fused quartz material with a front surface shape respectively 3.719 λ, and 0.427 λ (λ = 632.8nm). Comparison of the test results showed that the PV difference of optical homogeneity between the two was only 0.036 λ, Δn inaccuracy was 10~(-7), and the homogeneity morphology matched exactly. To further analyze the factors affecting the optical homogeneity, the front surface shape of the other sample was sliced in a predetermined direction. This artical analyzed the effect of morphology upon the slicing line on optical homogeneity. The conclusion was that the direct affecting factor on optical homogeneity was the slope of surface morphology, rather than the overall PV value.
机译:光学材料的光学均匀性直接影响折射光学系统的波前质量。随着传统的直接测量方法需要高精度表面形状加工用于光学材料(PV值<0.1λ,),它逐渐被四个步骤的方法逐渐取代,这需要较低的表面形状。本文采用600mm直径的外径干涉仪,四步方法测试了与前表面形状的相同500毫米直径熔融石英材料的光学均匀性,分别为3.719λ,0.427λ(λ= 632.8nm)。测试结果的比较表明,两者之间的光学均匀性的PV差异仅为0.036λ,Δn不准确为10〜( - 7),均匀性形态完全匹配。为了进一步分析影响光学均匀性的因素,将其他样品的前表面形状沿预定方向切成。这种艺术分析了形态对光学均匀性切片线的影响。结论是直接影响光学均匀性的因素是表面形态的斜率,而不是整体光伏值。

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