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Electrical Characteristics and Microstructures of Pr_2O_3-dopecl Bi_4Ti_3O_(12) Thin Films

机译:PR_2O_3-DOPECL BI_4TI_3O_(12)薄膜的电气特性和微观结构

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Pr_2O_3-doped bismuth titanate (Bi_(4-x)Pr_xTi_3O_(12): BPT) thin films with random oriention were fabricated on Pt/Ti/SiO_2/Si substrates by rf magnetron sputtering technique, and the structures and ferroelectric properties of the films were investigated. XRD studies indicated that all of BPT films consisted of single phase of a bismuth-layered structure with well-developed rod-like grains. For samples with x=0..0 , 0.25, 1.0 and 1.25,1-E characteristics exhibited negative differential resistance behaviors and their ferroelectric hysteresis loops were characterized by large leakage current, whereas for samples with x=0.5 and 0.75, I-E characteristics were simple ohmic behaviors and their ferroelectric hysteresis loops were the saturated and undistorted hysteresis loops. The remanent polarization ( P_r) and coercive field (E_c) of the BPT Film with x=0.75 were above 30μC/cm~2 and 75KV/cm, respectively.
机译:Pt / Ti / SiO_2 / Si基板通过RF磁控溅射技术,在PT / Ti / SiO_2 / Si基板上制造PT / Ti / SiO_2 / Si基板,并通过RF磁控溅射技术,以及薄膜的结构和铁电特性在Pt / Ti / SiO_2 / Si衬底上制造薄膜的PR_2O_3 - 掺杂的钛酸铋(Bi_(4-x)PR_XTI_3O_(12):BPT)薄膜被调查了。 XRD研究表明,所有BPT薄膜由具有良好发育的杆状晶粒的铋层结构的单相。对于具有X = 0..0的样品,0.25,1.0和1.25,1-e特性表现出负差分电阻行为,并且它们的铁电磁滞回路的特征在于漏电流大,而对于具有x = 0.5和0.75的样品,即特征是特征简单的欧姆行为及其铁电滞后环是饱和和未变形的滞后环。 BPT膜的倒置极化(P_R)和矫顽磁场(E_C)分别高于30μC/ cm〜2和75kV / cm。

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