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Characterisations of CoCu films electrodeposited at different cathode potentials

机译:不同阴极电位电沉积的Cocu膜的特征

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Structural and magnetic properties of CoCu films electrodeposited on polycrystalline Cu substrates were investigated as a function of cathode potential used for their deposition. The compositional analysis, performed by energy dispersive X-ray spectroscopy, demonstrated that an increase in the deposition potential results in an increase in Co content of CoCu films. The crystal structure of the films was studied using the X-ray diffraction (XRD) technique. It was observed that they have a face centred cubic (fee) structure, but also contain partly hexagonal close-packed phase. XRD results revealed that the (111) peak of fcc structure splits into two as Co (111) and Cu (111) peaks and the peak intensities change depending on the deposition potential and hence the film composition. The magnetic measurements were carried out at room temperature using a vibrating sample magnetometer. The magnetic findings indicated that coercivity decreases and saturation magnetisation increases with the increase of Co:Cu ratio caused by the deposition potential and also all films have planar magnetisation.
机译:电沉积在多晶的Cu基板科库薄膜的结构和磁特性进行了研究作为用于其沉积阴极电位的函数。的组成分析,通过能量分散型X射线分光法进行的,证明了在增加科库膜的Co含量的增加,沉积电势的效果。使用X射线衍射(XRD)技术的膜的晶体结构进行了研究。据观察,它们具有面心立方(fcc)结构,而且还含有部分地密排六方相。 XRD结果表明,以Co(111)和Cu(111)的峰和峰强度的变化取决于沉积电位,因此所述膜组合物fcc结构分裂的(111)峰分为二。磁性测量使用振动样品磁强计在室温下进行。磁性研究结果表明矫顽力减小,饱和磁化强度的增加与共同的增加:引起的沉积电势Cu比率,并且还所有膜具有平面磁化。

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