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Electrodeposition of tin-rich, tin-gold eutectic solders for optoelectronic and MEMS applications

机译:用于光电和MEMS应用的富含含锡的锡锡的锡 - 金共晶焊料的电沉积

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Tin-rich, Sn-Au solder films were fabricated using electrodeposition, from a suspension composed of a Sn electrolyte with suspended Au particles. The Sn-rich eutectic alloy offers a potentially cheaper alternative to the Au-rich eutectic for optoelectronic and MEMS device packaging and may be applicable as a Pb-free solder for microelectronic packaging. Eutectic and near-eutectic deposits, with uniform thicknesses and compositions were fabricated. Gold content in the deposits increased with increasing Au particle loading in the electrolyte and increasing current density. Room temperature aging led to the formation of AuSn_4 at the Au particle-Sn matrix interface. Reflow of deposits with near-eutectic compositions resulted in the formation of the two eutectic phases, Sn and AuSn_4.
机译:使用电沉积来制造富含酸的Sn-Au焊料膜,从由悬浮的Au颗粒组成的Sn电解质组成的悬浮液。富含Sn的共晶合金具有富含Au-Rich-Eutectic的替代替代光电和MEMS器件包装,并且可以应用于用于微电子包装的无铅焊料。制造着均匀厚度和组合物的共晶和近共晶沉积物。沉积物中的金含量随着电解质中的粒子载荷增加而增加,增加电流密度。室温老化导致AU粒子-SN矩阵界面形成AUSN_4。具有近共晶组合物的沉积物的回流导致形成两个共晶相,Sn和Ausn_4。

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