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Pulsed Metalorganic Chemical Vapor Deposition of In-Polar and N-Polar InN Semiconductors on GaN/Sapphire for Terahertz Applications

机译:用于太赫兹应用的GaN / Sapphire上的极性和N-POIL INN半导体的脉冲金属化学气相沉积

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摘要

Narrow bandgap (0.77eV) In- and N-polar InN semiconductors were grown by using pulsed metalorganic chemical vapor deposition. Ultrafast laser excitation on optimized In-polar InN sample resulted in terahertz radiation (0.25-2.0THz) with output power of 2.36μW.
机译:通过使用脉冲金属有机化学气相沉积来生长窄带隙(0.77EV)和N-POIL INN半导体。优化的极地inn样品上的超快激光激发导致太赫兹辐射(0.25-2.0thz)输出功率为2.36μW。

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