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Raman Studied of Undoped Amorphous Carbon Thin Film Deposited by Bias Assisted-CVD

机译:拉曼研究了由偏压辅助-CVD沉积的未掺杂非晶碳薄膜

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The undoped amorphous carbon thin film carbon was deposited at 200°C-350°C by bias assisted-CVD using palm oil as a precursor material. The effect of different substrate deposition temperatures on structural and electrical properties of undoped doped amorphous carbon film was discussed. The structural of undoped amorphous carbon films were correlated with Raman analysis through the evolution of D and G bands, Fourier spectra, and conductivity measurement. The spectral evolution observed showed the increase of upward shift of D and G peaks as substrate deposition temperatures increased. The spectral evolution observed at different substrate deposition temperatures show progressive formation of crystallites. It was predicted that small number of hydrogen is terminated with carbon at surface of thin film as shown by FTIR spectra since palm oil has high number of hydrogen (C_(67)H_(127)O_8). These structural changes were further correlated with conductivity and the results obtained are discussed and compared. The conductivity is found in the range of 10~(-8) Scm~(-1). The increase of conductivity is correlated by the change of structural properties as correlated with characteristic parameters of Raman spectra including the position of G peak, full width at half maximum of G peak, and Id/Ig and FTIR result.
机译:使用棕榈油作为前体材料,通过偏压辅助-CVD在200℃-350℃下沉积未掺杂的非晶碳薄膜碳。讨论了不同衬底沉积温度对未掺杂的掺杂非晶碳膜的结构和电性能的影响。通过D和G频带,傅里叶光谱和电导率测量的演变,未掺杂的非晶碳膜的结构与拉曼分析相关。观察到的光谱演化表明,随着基板沉积温度的增加,D和G峰的向上偏移的增加。在不同的基板沉积温度下观察到的光谱演进显示微晶的逐渐形成。预测,少量氢在薄膜表面上终止,如FTIR光谱所示,因为棕榈油具有大量氢气(C_(67)H_(127)O_8)。这些结构变化与导电性进一步相关,并讨论并比较了所得结果。导电性在10〜(8)SCM〜(-1)的范围内。通过与拉曼光谱的特征参数相关的结构性能的变化,导电性的增加是相关的,包括G峰的位置,半最大G峰的全宽,以及ID / Ig和FTIR结果。

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