High sensitivity Ultra-Violet photosensor based on nanostructured Nb_2O_5

摘要

This work reports the characterization of UV sensor based on nanomoss Nb_2O_5 films. Nb_2O_5 has been synthesized by hydrothermal etching reaction of niobium foil in fluoride ion based solution. The morphological and structural of nanomoss N_(b2)O_5 are investigated using FESEM and XRD techniques to determine the properties of the film. From UV characterization, the UV sensor has exhibited good photosensitivity of 2.0 when exposed under turn on/off of UV light.