首页> 外文会议>Symposium on Semiconductor Defect Engineering >Interaction between Recombination Enhanced Dislocation Glide Process Activated Basal Stacking Faults and Threading Dislocations in 4H-Silicon Carbide Epitaxial Layers
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Interaction between Recombination Enhanced Dislocation Glide Process Activated Basal Stacking Faults and Threading Dislocations in 4H-Silicon Carbide Epitaxial Layers

机译:重组增强位错滑动过程之间的相互作用激活基底堆叠故障和4H-碳化硅外延层中的螺纹位错

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Electron-hole recombination enhanced glide of Shockley partial dislocations bounding expanding stacking faults and their interactions with threading dislocations in 4H silicon carbide epitaxial layers have been studied using synchrotron white beam X-ray topography and in situ electroluminescence. The mobile silicon-core Shockley partial dislocations bounding the stacking faults are able to cut through threading edge dislocations leaving no trailing dislocation segments in their wake. However, when the Shockley partial dislocations interact with threading screw dislocations, trailing 30o partial dislocation dipoles are initially deposited in their wake due to the pinning effect of the threading screw dislocations. These dipoles spontaneously snap into their screw orientation, regardless the normally immobile carbon-core Shockley partial dislocation components in the dipoles. They subsequently cross slip and annihilate, leaving a prismatic stacking fault in (2-1-10) plane with the displacement vector 1/3[01-10].
机译:电子 - 空穴复合增强Shockley不全脱位边界扩大堆垛层错和它们与在4H碳化硅外延层穿透位错的相互作用的滑行已经使用同步加速器白色光束X射线形貌和原位电致发光的研究。界定的堆垛层错的移动硅芯Shockley不全位错能够切穿贯通刃状位错不留下任何尾随脱位节段在其唤醒。然而,当Shockley不全脱位螺纹与螺型位错,尾部30°部分位错偶极子最初沉积在其唤醒由于螺纹螺型位错的钉扎效应相互作用。这些偶极子自发卡入其螺纹方向,而不管在偶极子的常动的碳芯Shockley不全脱位组件。他们随后交滑移和湮灭,留下(2-1-10)面的棱柱形堆垛层错与位移矢量1/3 [01-10]。

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